化工新型材料

化工新型材料 ›› 2022, Vol. 50 ›› Issue (7) : 91-94. DOI: 10.19817/j.cnki.issn1006-3536.2022.07.019

新材料与新技术

Tb³⁺∶KY(WO₄)₂薄膜的制备及其荧光性能的研究

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Study on preparation of Tb³⁺∶KY(WO₄)₂ film and its fluorescence property

Guo Kunfeng, Shen Binbin, Tang Liyong

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Received		Published
2021-04-07		2022-07-20
Issue Date	Revised Date
2022-08-09	2021-04-07

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摘要

采用浸渍提拉法以SiO₂为缓冲层在石英基片上制备Tb³⁺∶KY(WO₄)₂薄膜。通过X射线衍射、扫描电镜、原子力显微镜和荧光光谱进行表征。结果表明:加入缓冲层薄膜具有垂直于c轴的择优取向,石英基片与薄膜之间的晶格失配为9.7%,薄膜的结晶度为87.9%,厚度在10～15nm之间,表面粗糙度Ra=13.346nm。激发光谱和发射光谱显示,254nm激发光可发射545nm的绿光,545nm处的荧光寿命是0.69ms。

Abstract

Tb³⁺∶KY(WO₄)₂ film was prepared on the quartz substrate by dipping and pulling method with SiO₂ as the buffer layer.Characterized by XRD,SEM,AFM and PL.The results shown that the film with the buffer layer had preferred orientation perpendicular to the c-axis,the crystal lattice mismatch between the quartz substrate and the film was 9.7%,the crystallinity of the film was 87.9%,the thickness was between 10～15nm,and the surface was rough.Degree Ra=13.346nm.The excitation spectrum and emission spectrum shown that the excitation light at 254nm can emit green light at 545nm,and the fluorescence lifetime at 545nm was 0.69ms.

关键词

薄膜 / Tb³⁺∶KY(WO₄)₂ / 缓冲层 / 荧光性能

Key words

film / Tb³⁺∶KY(WO₄)₂ / buffer layer / fluorescent property

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Tb³⁺∶KY(WO₄)₂薄膜的制备及其荧光性能的研究[J]. 化工新型材料, 2022, 50(7): 91-94 DOI:10.19817/j.cnki.issn1006-3536.2022.07.019

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