以阳极氧化铝(AAO)为模板,利用磁控溅射法制备了Ni亚微米管阵列。通过X射线衍射仪(XRD)、原子力显微镜(AFM)、扫描电子显微镜(SEM)等手段对沉积态以及经过400℃退火保温不同时间制备的Ni亚微米管阵列的物相结构及微观形貌进行了表征。结果表明:磁控溅射法制备的Ni亚微米管阵列具有多晶的面心立方结构。随着退火时间的增加,Ni亚微米管逐渐增多,Ni衍射峰强度逐渐降低。经400℃退火3h后,获得结构完整、高度有序的Ni亚微米管阵列,Ni亚微米管的大小均匀,外径约为400nm,内径约为200nm,长度约为500nm。
Using anodic aluminum oxide (AAO) as template,Ni submicron tube array was prepared by magnetron sputtering.The crystal structure and surface morphology of Ni submicron tubes array prepared by annealing at 400℃ for different holding times were characterized by X-ray diffraction (XRD),atomic force microscope (AFM) and scanning electron microscopy(SEM).The results shown that Ni submicron tubes array had polycrystalline face-centred cubic (FCC) structure.With the increase of annealing time,Ni submicron tubes gradually increased and the intensity of Ni diffraction peak decreased gradually.After annealing at 400℃ for 3h,Ni submicron tubes with complete structure and orderly arrangement were obtained.The outer diameter of Ni submicron tube was about 400nm,the inner diameter was about 200nm,and the length was about 500nm.
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基金资助
乐山市科技局重点研究项目(20ZDYJ0262);乐山师范学院科研项目(DGZZ202026)
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