Based on the method of cyclic voltammetric polymerization,30mmol/L acetic acid as template molecule,5mmol/L phenol as functional monomer,0.1mol/L potassium chloride and 0.05mol/L phosphate buffer solution(pH 5.4) as the polymerization base solution,the polymerization potential was 0.8～1.2V,the scanning coil number was 20,the elution of 0.1mol/L sodium bicarbonate solution was used as eluting solution for 20min,and the acetic acid molecular printing film with best performance was obtained.The film was characterized by cyclic voltammetry(CV),impedance,scanning electron microscopy and differential pulse,the effects of different pH phosphate buffer solutions,different concentrations of eluent and different eluting time on the properties of the film were investigated.When 0.05mol/L phosphate buffer solution (pH 5.4) was used as the optimum substrate,there was a good linear relationship between acetic acid imprinted film and acetic acid molecule in the concentration range of 0～45×10-9mol/L.The detection limit was 2.85×10-9mol/L,and the reproducibility and stability of the film were studied.
[1] 李彩侠,马宇亮,黄微薇.分子印迹技术的基本原理及其发展方向[J].高师理科学刊,2016,44(2):1007-9831.
[2] 于芳芳.分子印迹聚合物的制备及在薯片中丙烯酰胺检测中的应用[D].镇江:江苏大学,2018:3-12.
[3] 毛禄刚.分子印迹电化学传感器检测食品中丙烯酰胺的研究[D].长沙:湖南农业大学,2015:2-6.
[4] 谢黎明.新型分子印迹电化学传感器的制备及其对农药残留检测性能的研究[D].杭州:浙江工业大学,2017:9-12.
[5] 李腾飞.新型分子印迹材料制备及其在化学污染物检测中的应用研究[D].北京:中国农业科学院,2016:21-32.
[6] 刘瑛.基于电聚合技术的新型分子印迹传感器的研究及应用[D].无锡:江南大学,2013:21-36.
[7] Schab-Balcerzak E.Electropolymerization[M].Croatia:In Tech,2011:187-190.
[8] 栾崇林,李铭杰,李仲谨,等.分子印迹电化学传感器的研究进展[J].化工进展,2011,30(2):353-358.
[9] Syritski V,Reut J,Menaker A,et al.Electrosynthesized molecularly imprinted polypyrrole films for enantioselective recognition of l-aspartic acid[J].ElectrochimActa,2008,53(6):2729-2736.
[10] 罗培丽.纳米材料/氨基酸修饰电极的制备及应用[D].郑州:郑州大学,2013:1-3.
[11] 彭友元,骆心灵,陈文凭.分子印迹电化学传感器测定对乙酰氨基酚[J].泉州师范学院学报,2017,35(6):1009-8224.
[12] 胡琪,谭学才,杨素平,等.呋喃妥因分子印迹电化学传感器的制备及应用[J].分析科学学报,2016,32(1):63-6620.
[13] 刘娟.改性酚醛树脂基泡沫材料的制备与性能研究[D].北京:中国林业科学研究院,2017:61-86.
[14] 李勇修.电化学聚合制备取向导电聚合物[D].北京:北京化工大学,2015:9-53.
[15] 王艇.交流阻抗法评价O/W型乳液氧化稳定性[D].无锡:江南大学,2015:27-39.
[16] 曹清彬,胡明刚,邓启刚,等.席夫碱还原制备氮氧多齿配体的研究[J].山东化工,2015,44(22):1-3,6.
[17] 余会成,黄学艺,韦贻春,等.纳米氧化铜掺杂的苯巴比妥分子印迹电化学传感器的制备及其识别性能研究[J].分析化学,2014,42(11):1661-1666.
