银纳米线薄膜的制备及电磁屏蔽性能研究

卢健, 危韦, 杨光, 高彦峰*

化工新型材料 ›› 2019, Vol. 47 ›› Issue (9) : 104 -108.

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化工新型材料 ›› 2019, Vol. 47 ›› Issue (9) : 104-108.
新材料与新技术

银纳米线薄膜的制备及电磁屏蔽性能研究

    卢健, 危韦, 杨光, 高彦峰*
作者信息 +

Preparation of silver nanowire film and its application in electromagnetic shielding

  • Lu Jian, Wei Wei, Yang Guang, Gao Yanfeng
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摘要

电磁干扰、电磁辐射对人类生产生活的影响越来越严重,电磁屏蔽材料因而应运而生。目前的电磁屏蔽材料中,金属纳米线具有较高的电导率和可弯折性能,其中银纳米线因具有化学稳定性好、制备成本较低、成膜后易修复、可大批量生产等优势,成为新一代电磁屏蔽材料。以溴化钠和氯化铁为原料制备银纳米线并将其半嵌入到聚氨酯膜形成屏蔽材料。制备的银纳米线@聚氨酯薄膜无需后期热处理,方块电阻达到10Ω/sq,当薄膜厚度达到5μm时,其电磁屏蔽效能超过40dB。与此同时,制备的半嵌入式结构银纳米线@聚氨酯薄膜具有优良的耐弯折性能(弯折500次方块电阻变化率<0.5,电磁屏蔽效能变化率为3%)和力学稳定性能(粘接200次方块电阻变化率<0.35)。

Abstract

Electromagnetic interference and radiation have more and more influenced human's production and health,thus the electromagnetic shielding materials came into being.Metal nanowires have high conductivity and bendable properties among the existing electromagnetic shielding materials.Especially,the silver nanowires which have the advantages of good chemical stability,low-cost preparation,convenience in mass production have been the new generation of electromagnetic shielding material.The preparation of silver nanowires used sodium bromide and ferric chloride and semi-embedded structure of the nanowires film forming process were introduced.Sheet resistance of the film can reach 10Ω/sq.When the film thickness reached 5 microns,the electromagnetic shielding efficiency was more than 40dB.The semi-embedded silver nanowire@polyurethane structure had excellent bending resistance (bending 500 times,ΔR/R0<0.5,ΔSE/SE0=3%) and mechanical stability (glue 200 times,ΔR/R0<0.35),which provided an ideal technical solution for the preparation and application of electromagnetic shielding materials.

关键词

电磁辐射 / 电磁屏蔽 / 银纳米线 / 半嵌入式

Key words

electromagnetic radiation / electromagnetic shielding / silver nanowire / semi-embedded structure

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银纳米线薄膜的制备及电磁屏蔽性能研究[J]. 化工新型材料, 2019, 47(9): 104-108 DOI:

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基金资助

国家优秀青年学者(51325203);上海市科学技术委员会优秀学术带头人项目(15XD1501700);长江学者项目(T2015136)

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