化工新型材料

化工新型材料 ›› 2025, Vol. 53 ›› Issue (2) : 131-134. DOI: 10.19817/j.cnki.issn1006-3536.2025.02.050

科学研究

射频磁控溅射法制备MoS₂纳米薄膜的光学性能研究

樊志琴, 邢淑涵, 李瑞, 张丽英, 张俊峰

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Study on the optical properties of MoS₂ nanofilms prepared by RF magnetron sputtering

Fan Zhiqin, Xing Shuhan, Li Rui, Zhang Liying, Zhang Junfeng

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Received
2024-09-23
Issue Date	Revised Date
2025-02-20	2024-09-23

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摘要

采用射频磁控溅射法在石英玻璃衬底表面沉积不同厚度的MoS₂纳米薄膜,利用扫描电镜(SEM)、X射线衍射(XRD)、紫外-可见光分光光谱(UV-Vis)和荧光光谱等手段对MoS₂薄膜结构及光谱性质进行表征。结果表明:溅射时间越长,MoS₂薄膜的结晶性越好。薄膜形成条状纳米结构相互交叠的表面形貌,样品表面形貌均匀致密。MoS₂纳米薄膜在可见光波段对短波长光源吸收较强,对长波长光源透射较强。随着溅射时间的增加,薄膜厚度增加,导致MoS₂纳米薄膜的吸收系数增加,透射率减小,光学带隙也逐渐减少。在MoS₂薄膜的发射谱中,位于675nm的A激子峰,对应的带隙为1.8eV。发射峰的强度随着MoS₂薄膜层数的增加而减小,发射峰的位置随着MoS₂薄膜层数的增加而蓝移。

Abstract

MoS₂ nanofilms with different thicknesses were deposited on quartz glass substrates by radio-frequency (RF) magnetron sputtering method.The structure and optical properties of the MoS₂ films were characterized using SEM,XRD,UV-Vis and fluorescence spectrometry.The results indicated that the longer the sputtering time,the better the crystallinity of the MoS₂ films.The films formed a surface morphology with interlaced strip-like nanostructures,and the sample surface morphology was uniform and dense.The MoS₂ nanofilms had strong absorption for short-wavelength light sources in the visible light band and strong transmission for long-wavelength light sources.With the increase of sputtering time,the thickness of the film increased,leading to the increase of absorption coefficient,the decrease of transmittance and the gradual decrease of optical bandgap of the MoS₂ nanofilm.In the emission spectrum of the MoS₂ films,the A exciton peak at 675nm corresponded to a bandgap of 1.8eV.The intensity of the emission peak decreased as the number of MoS₂ film layers increased,and the position of the emission peak exhibited a blueshift as the number of layers of MoS₂ film increased.

关键词

MoS₂薄膜 / 射频磁控溅射 / 光学性能 / 激子峰

Key words

MoS₂ film / RF magnetron sputtering / optical properties / exciton peak

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射频磁控溅射法制备MoS₂纳米薄膜的光学性能研究[J]. 化工新型材料, 2025, 53(2): 131-134 DOI:10.19817/j.cnki.issn1006-3536.2025.02.050

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