采用自组装技术在石英表面制备了十八烷基三氯硅烷(OTS)分子膜,并通过接触角、红外光谱(FT-IR)和原子力显微镜(AFM)研究了膜层形貌特征和膜层表面能量耗散随温度的变化情况。结果表明:OTS在石英上以“岛”状团簇的结构均匀分布,反应时间越长,“岛”状团簇和吸附的OTS分子数量也越多,表面粗糙度随之增加。接触角在反应时间达到30min后稳定在110.39°左右,此时反应趋于饱和。膜层表面耗散值在60～80℃内最低,当温度低于61℃时,5mmol/L溶度下制备的分子膜表面最平坦稳定,膜层耗散值也最低,温度高于61℃时,表面出现熔化现象,耗散曲线波动较大,考虑是水解的OTS产物和表面杂质的存在影响了测试结果。
Octadecyltrichlorosilane (OTS) molecular films was prepared on the surface of quartz by self-assembly technology.The surface morphology characteristics of the film layers and the change of surface energy dissipation with temperature were studied by contact angle,FT-IR and atomic force microscopy (AFM).The results showed that OTS was uniformly distributed in the form of “island” clusters on quartz.The longer the reaction time,the more the “island” clusters and successfully adsorbed OTS molecules,and the surface roughness also increased.The contact angle was stabled at about 110.39℃ after the reaction time reached 30 minutes,indicating saturation.The film surface dissipation value was the lowest within the temperature range of 60～80℃.When the temperature was lower than 61℃,the surface of the molecular film prepared at 5mmol/L solubility was the most flat and stable,and the dissipation value of the film was also the lowest.However,when the temperature was higher than 61℃,the surface appeared melting phenomenon and significant fluctuations in the dissipation curve.It was considered that the existence of hydrolytic OTS products and surface impurities affected the test results.
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基金资助
科技部国家重点研发计划项目(2017YFE0130200);国家自然科学基金(61874100);山西省重点研发计划项目(201803D421037)
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