科学研究

表面沉积钨织物的制备与表征

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  • 生态纺织教育部重点实验室(江南大学),无锡214122
杨晔(1997-),女,研究生,硕士,主要研究方向为电磁屏蔽及吸波材料,E-mail:1252988367@qq.com。

收稿日期: 2020-05-26

  修回日期: 2021-06-10

  网络出版日期: 2021-09-30

基金资助

中央高校基本科研业务费专项资金(JUSRP52007A)

Preparation and characterization of surface deposited tungsten fabrics

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  • Key Laboratory of Eco-Textiles,Ministry of Education,Jiangnan University,Wuxi 214122

Received date: 2020-05-26

  Revised date: 2021-06-10

  Online published: 2021-09-30

摘要

为探究金属钨在电磁屏蔽和射线防护领域的应用可行性,采用射频磁控溅射法,在高经密涤纶长丝织物表面沉积金属钨,探究钨薄膜的物化结构,并对表面沉积金属钨织物的电磁屏蔽性能进行了测试。结果表明:溅射功率增加,钨的结晶度、取向度提高,钨膜的连续性、均匀性改善;溅射压强在一定范围内增加时,钨薄膜的结晶度、均匀性提高,但增至一定程度时,钨膜的匀整性反而下降;随溅射时间增加,钨薄膜连续性和匀整性提高。经实验优化后,在60W、1.0Pa、60min溅射条件下附带导电布的钨/涤纶复合织物平均电磁屏蔽性能值高达94dB,体现较好的电磁屏蔽性能。

本文引用格式

杨晔, 胡学囡, 徐阳, 钱坤 . 表面沉积钨织物的制备与表征[J]. 化工新型材料, 2021 , 49(9) : 170 -173 . DOI: 10.19817/j.cnki.issn 1006-3536.2021.09.038

Abstract

In order to explore the application feasibility of tungsten in electromagnetic shielding and radiation protection,tungsten metal was deposited on the surface of high density polyester filament fabric by RF magnetron sputtering,and the physical and chemical structure of tungsten film was explored.The electromagnetic shielding performance of tungsten metal fabric were tested.The results shown that with the increase of sputtering power,the crystallinity and orientation of tungsten increased,and improved the continuity and uniformity of tungsten film.With the increase of sputtering pressure within a certain range,the crystallinity and uniformity of tungsten film increased.But with the increase of sputtering pressure to a certain extent,the uniformity of tungsten film decreased.With the increase of sputtering time,the continuity and uniformity was improved.After experimental optimization,the average value of electromagnetic shielding performance of tungsten/polyester composite fabric with conductive cloth under 60W,1.0Pa and 60min sputtering conditions was up to 94 dB,which shown good electromagnetic shielding performance.

参考文献

[1] 万刚,李荣德.电磁屏蔽材料的进展[J].安全与电磁兼容,2003(1):40-41,45.
[2] 陈莉,薛洁,刘皓,等.电磁屏蔽织物的研究现状[J].纺织导报,2018(3):68-71.
[3] 周武平,张莹莹,王学兵,等.球形钨粉的制备及应用[J].稀有金属材料与工程,2019,48(8):2594-2601.
[4] 张梦晗,姜国圣,王鹏为,等.选择性激光熔化制备纯钨的性能研究[J].稀有金属材料与工程,2019,48(5):1645-1650.
[5] 师艳丽,李娜娜,付元静,等.用于纺织品表面改性的磁控溅射技术研究进展[J].纺织学报,2016,37(4):165-169.
[6] 黄新民,孟灵灵.涤纶基表面磁控溅射纳米铜膜的电磁屏蔽性能[J].印染,2013,39(18):15-17.
[7] 徐阳,魏取福,邓炳耀.溅射功率对沉积纳米TiO2织物光催化性能的影响[J].纺织学报,2011,32(10):31-36.
[8] 赵晓曼,傅佳佳,王鸿博.非织造基网格型碳纤维复合材料的屏蔽性能分析[J].化工新型材料,2015,43(1):123-125.
[9] 杨召,佐同林.电磁屏蔽织物的研究进展[J].毛纺科技,2016,44(1):14-18.
[10] 冯丽萍,刘正堂.薄膜技术与应用[M].西安:西北工业大学出版社,2016,60-110.
[11] 王月花,黄飞.薄膜的设计、制备及应用[M].徐州:中国矿业大学出版社,2016,69-138.
[12] 盛澄成,徐阳,魏取福.层状复合电磁屏蔽材料的制备及性能研究[J].化工新型材料,2017,45(5):61-63.
[13] 孟灵灵,魏取福,黄新民,等.磁控溅射工艺参数对涤纶织物表面沉积铜膜性能的影响[J].材料导报,2012,26(6):54-57,69.
[14] Zhang R,Huo Z,Jiao X,et al.Deposition of tungsten thin films on flexible polymer substrates by direct-current magnetron sputtering[J].Journal of Electronic Materials,2015,44(11):4557-4562.
[15] 赵灵智,胡社军,何琴玉,等.电磁屏蔽材料的屏蔽原理与研究现状[J].包装工程,2006,27(2):1-4.
[16] 肖鹏远,焦晓宁.电磁屏蔽原理及其电磁屏蔽材料制造方法的研究[J].非织造布,2010(5):15-19.
[17] 王建忠,奚正平,汤慧萍,等.金属纤维电磁屏蔽材料的研究进展[J].稀有金属材料与工程,2011,40(9):1688-1692.
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