开发与应用

高纯四甲基硅烷合成工艺及提纯技术

展开
  • 洛阳中硅高科技有限公司,洛阳471023
贺玉刚(1991-),男,硕士,主要从事电子级四甲基硅烷的研发。

收稿日期: 2020-01-19

  修回日期: 2021-03-12

  网络出版日期: 2021-06-29

Synthesis and purification technology of high-purity tetramethylsilane

Expand
  • Luoyang Zhonggui High Technology Co.,Ltd.,Luoyang 471023

Received date: 2020-01-19

  Revised date: 2021-03-12

  Online published: 2021-06-29

摘要

随着四甲基硅烷市场需求的膨胀,供求关系得到改善,行业盈利能力稳步提升,带动了四甲基硅烷精制技术的迅速发展。介绍了高纯四甲基硅烷的应用市场,综述了高纯四甲基硅烷的制备工艺,分析各自的优点及不足,并展望了未来的发展趋势。分析指出,应加强校企联合力度,增强研发力量,优化合成工艺和提纯技术,同时建立痕量杂质检测方法和质量管理体系,保障产品质量的稳定。

本文引用格式

贺玉刚, 万烨, 常欣, 王芳, 袁振军, 赵喜哲 . 高纯四甲基硅烷合成工艺及提纯技术[J]. 化工新型材料, 2021 , 49(6) : 262 -264 . DOI: 10.19817/j.cnki.issn 1006-3536.2021.06.057

Abstract

With the expansion of market demand for tetramethylsilane,the relation-ship between supply and demand has improved,and the industry's profitability has steadily increased,driving the rapid development of tetramethylsilane refining technology.The application market of high-purity tetramethylsilane was introduced,and summarized the preparation process of high-purity tetramethylsilane,analyzed their respective advantages and disadvantages,and made a brief analysis of its future development trends.It was pointed out that the joint efforts of schools and enterprises should be strengthened,the research and development should be strengthened,the synthesis process and purification technology should be optimized,and the trace impurity detection method and quality management system should be established to ensure the stability of product quality.

参考文献

[1] Willeams D H,Fleming I,著.王剑波,施卫峰,译.有机化学中的光谱方法[M].北京:北京大学出版社,2001:52.
[2] Ellenberger M A,Hendewerk M L,Well D A,et al.Measurement of hydrogen/deuterium ratios in ethanollethanol-0-d mixtures by chemical ionization mass spectrometry with tetramethylsilane as reagent gas[J].Anal Chem,1982(54):1309-1313.
[3] Qdiorn T J,Harvey D J,Vouros P.Chemical ionization mass spectrometry using tetramethylsilane[J].The Journal of Physical Chemistry,1972,76(22):32173220.
[4] Rubens L C,Warren J S.Latent-foaming vinyl aromatic resin compositions containing tetramethylsilane as blowing agent:US,3033805[P].1962-05-08.
[5] Fonseca J L C,Tasker S,Apperley D C.Plasma-enhanced chemical vapor deposition of organosilicon materials:a comparison of hexame-thyldisilane and tetramethylsilane precursors[J].Macromolecules,1996,29:1705-1710.
[6] Konotek O,Loffler F.Amorphous and crystalline phases in PVD coatings after laser treatment[J].Mater Sci Eng:A,1991,140,655-659.
[7] Xu M,Sayasane T,Girard J M.Purification of silicon-containing materials:US,2005054211AI[P].2005-03-10.
[8] Fonseca J L C,Apperley D C,Badyar J P S.Plasma polymerization of tetramethylsilane[J].Chem Mater,1993,5:1676-1682.
[9] Yasuda H,Bumgarner M O,Marsh H C,et al.Plasma polymerization of some organic compounds and properties of the polymers[J].Polym Sci:Polym Chem Ed,1976,14(I):195-224.
[10] 周俊虎,杨卫娟,张彦威.一种燃烧四甲基硅烷制备白炭黑的装置:中国,CN203006956[P].2013-08-03.
[11] 胡卿,周俊虎,程军.四甲基硅烷燃烧法制备气相白炭黑的研究[J].能源工程,2014(2):12-15.
[12] 郑国栋,肖军,闻久绵,等.合成1-三甲硅基丙炔的新方法:中国,CN1063872[P].1992-08-26.
[13] Chadwick K M,Halm Roland L,Keyes Brian R,et al.Integrated process for alkylation and redistribution of halosilanes:US,4888435[P].1989-12-19.
[14] Halm Roland L,Chadwick K M,Keyes Brian R,et al.Preparation of organosilanes:US,4946980[P].1990-08-07.
[15] 王雪飞.甲基三氯硅烷转化反应及组合工艺研究[D].杭州:浙江大学,2004.
[16] 幸松民,王一路,编著.有机硅合成工艺及产品应用[M].北京:化学工业出版社,2000.
[17] 周婷婷.甲基氯硅烷副产低沸物分析和四甲基硅烷提取方法的研究[D].杭州:浙江大学,2010.
[18] 蒋自立.纯四甲基硅烷的制备[[J].中外技术情报,1993(8):3234.
Options
文章导航

/