Removal of refractory organic compound humic acid by Sr-TiO2/PCFM photocatalyst
Han Fan1,Zhang Yi2,Trinh Xuantung1,Liu Zisen2,3,Xu Dong2,He Feng2,Wu Zhenbin1,2
1.School of Resource & Environmental Engineering,Wuhan University of Technology, Wuhan 430070;
2.State Key Laboratory of Freshwater Ecology and Biotechnology, Institute of Hydrobiology,Chinese Academy of Sciences,Wuhan 430072;
3.University of Chinese Academy of Sciences,Beijing 100049
Abstract: Humic acid (HA) is a kind of refractory organics which widely existed in natural environment.The nano-TiO2 film coated on porous ceramic filter media (PCFM) was prepared by sol-gel process and formed Sr-TiO2/PCFM multiplex photocatalyst,the degrade effect of HA with the photocatalyst was studied.The results showed that the degradation rate of HA could reach 86.82% when the initial concentration of HA was 20mg/L,pH 5.98 and temperature 37℃.The degradation rate of HA was still more than 40% after Sr-TiO2/PCFM reused for three times.
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